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US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 14 for "Specialized transistors" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,849, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Specialized transistors" was in... Read More


US Patent Issued to MITSUMI ELECTRIC on July 14 for "Silicon carbide semiconductor device" (Japanese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,850, issued on July 14, was assigned to MITSUMI ELECTRIC Co. LTD. (Tokyo). "Silicon carbide semiconductor device" was invented by Shota Sam... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 14 for "Semiconductor structure" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,851, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor structure" was in... Read More


US Patent Issued on July 14 for "Field peak reduction in semiconductor devices with metal corner rounding" (California, North Carolina Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,852, issued on July 14. "Field peak reduction in semiconductor devices with metal corner rounding" was invented by Olof Tornblad (San Jose,... Read More


US Patent Issued to MITSUMI ELECTRIC on July 14 for "Silicon carbide semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,853, issued on July 14, was assigned to MITSUMI ELECTRIC Co. LTD. (Tokyo). "Silicon carbide semiconductor device" was invented by Yu Saitoh... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 14 for "Interconnect structure having a multi-deck conductive feature and method of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,854, issued on July 14, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan). "Interconnect structure having a mul... Read More


US Patent Issued to Semiconductor Manufacturing International (Shanghai), Semiconductor Manufacturing International (Beijing) on July 14 for "Semiconductor structure comprising air spacer on sidewalls of gate electrode layer and fabrication method thereof" (Chinese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,855, issued on July 14, was assigned to Semiconductor Manufacturing International (Shanghai) Corp. (Shanghai) and Semiconductor Manufacturin... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on July 14 for "Semiconductor device with compositionally varied hafnium-containing dielectric layers and fabrication method thereof" (Taiwanese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,856, issued on July 14, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Semiconductor device with compositi... Read More


US Patent Issued to Semiconductor Manufacturing International (Shanghai) on July 14 for "Semiconductor structure and fabrication method thereof" (Chinese Inventor)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,857, issued on July 14, was assigned to Semiconductor Manufacturing International (Shanghai) Corp. (Shanghai). "Semiconductor structure and... Read More


US Patent Issued to Shanghai Huali Integrated Circuit on July 14 for "Process integration method for improving leakage in MV device" (Chinese Inventors)

ALEXANDRIA, Va., July 14 -- United States Patent no. 12,684,858, issued on July 14, was assigned to Shanghai Huali Integrated Circuit Corp. (Shanghai). "Process integration method for improving leaka... Read More